Chemical vapour deposition

Chemical vapour deposition (CVD) is a powerful technology for producing high-quality solid thin films and coatings. Although widely used in modern industries, it continuously being developed as adapted to new materials. Today, CVD synthesis pushed heights with the precise manufacturing of both inorganic 2D materials high-purity polymeric that can be conformally deposited on various substrates. In this Primer, an overview technique, including instrument construction, process control, material characterization reproducibility issues, provided. By taking graphene, transition metal dichalcogenides (TMDs) typical examples, best practices experimentation involving substrate pretreatment, high-temperature growth post-growth processes are presented. Recent advances scaling-up challenges also highlighted. analysing current limitations optimizations, we provide insight into possible future directions method, reactor design high-throughput low-temperature films. This Primer chemical summarizes emerging experimental set-ups well common approaches determine film formation quality applied graphene other novel